Types of V-Shape AAO Templates
|SKU||Opening Aperture||Bottom Aperture||Hole Depth||Size|
|A3010021||90nm||40nm||160-200nm||2cm x 2cm|
|A3030021||300nm||100nm||280-320nm||2cm x 2cm|
|A3010011||90nm||40nm||160-200nm||1cm x 1cm|
|A3030011||300nm||100nm||280-320nm||1cm x 1cm|
The tapered hole (V) AAO template changes the normal vertical channel AAO template into a structure with large pore size above and small pore size below. The structure is especially suitable for nano surface construction‚ such as nano-imprint lithography. In the release phase of the process‚ V channel has a great advantage over the vertical channel.
V Shape AAO Templates，2cmx2cm
ACS Provides these Custom Order Services:
- Large size or special parameter AAO Templates.
- Transfer of ultrathin AAO. The present standard product: 50-400 nm pore diameter‚ 110-450nm interpore distance‚ and 5-50um thickness. Applications: As a mask for nanodot or quantum dot array by deposition methods; As an etching mask for nanopore array on substrates; Nano-imprinting template for nanostructures on softer surfaces‚ especially polymer surfaces. For substrates: Transfer to silicon‚ silicon oxide‚ ITO‚ glass‚ copper‚ HOPG etc. ACS must assume that the surface of the provided substrates have been thoroughly cleaned and cannot take responsibility for pre-existing impurities.
Please call with your particular requirements.