XRD Ultra-High Temperature Heating Stage AXH1200
Product Detail
InSitu Pro™ AXH1200 is an XRD ultra-high-temperature heating stage for in-situ variable-temperature X-ray diffraction: resistive heating from RT to 1200 °C at ±0.1 °C stability, with setpoint, ramp, and multi-segment program temperature control and a control rate adjustable from 0.1 to 20 °C/min. The arc-shaped window uses Kapton film and opens a 2θ range of 0°–164° over a ceramic 20 × 20 mm sample stage that is selectable for reflection or transmission. The stage operates in an atmosphere chamber, measures 120 × 120 × 88.5 mm at 0.8 kg, and custom mounting brackets adapt it to diffractometers from Rigaku, Bruker, Thermo Fisher Scientific, Shimadzu, Malvern Panalytical, and others.
Key features
- Built for X-ray diffractometersAn in-situ variable-temperature stage designed for XRD: custom mounting brackets adapt it to diffractometers from Rigaku, Bruker, Thermo Fisher Scientific, Shimadzu, Malvern Panalytical, and other manufacturers — the bracket for your instrument is confirmed at quotation.
- RT to 1200 °C, resistiveUltra-high-temperature resistive heating at ±0.1 °C stability, with setpoint, ramp, and multi-segment program control modes for precise in-situ temperature profiles.
- 2θ 0°–164° arc windowThe arc-shaped Kapton-film window provides a wide 2θ range of 0°–164° for wide-angle diffraction measurements.
- Reflection / transmission selectableThe ceramic 20 × 20 mm sample stage is selectable for reflection or transmission; the configuration for your diffractometer and experiment is confirmed at quotation.
- Fine-rate temperature controlThe temperature control rate is adjustable from 0.1 to 20 °C/min, supporting slow to faster programmed temperature ramps.
- Atmosphere-chamber body · 120 × 120 × 88.5 mm120 × 120 × 88.5 mm at a net weight of 0.8 kg; the standard configuration includes a water-circulation system. Mounting load, clearances, and bracket geometry are confirmed at quotation.
Product specifications
| Parameter | AXH1200 |
|---|---|
| Model # | AXH1200 |
| SKU # | EIXH1200 |
| Heating Method | Resistive heating |
| Temperature Range | RT ~ 1200 °C |
| Temperature Stability | ±0.1 °C |
| Temperature Control Rate | 0.1 ~ 20 °C/min |
| Sample Stage | Ceramic · 20 × 20 mm |
| Diffraction Angle 2θ | 0° ~ 164° |
| Window Material | Kapton film |
| Chamber | Atmosphere |
| Dimensions | 120 × 120 × 88.5 mm |
| Net Weight | 0.8 kg |
Basic configuration
| Included with every stage | Qty |
|---|---|
| Main unit (AXH1200 XRD ultra-high-temperature heating stage) | 1 |
| Temperature controller | 1 |
| Water-circulation system | 1 |
| Temperature-control software | 1 |
| Connection cables, tubing & accessories | — |
Options include adapter plates, custom water circulators, host PCs, and custom temperature-control software. Final applicability and configuration are confirmed at quotation.
Heating in air? Plan for oxidation
When operated in air at elevated temperature, many metals and alloys may oxidize — the extent depends on material composition, surface condition, temperature, atmosphere, and exposure time. Hold a sample for an hour at a temperature within the simulator range and see:
Model: parabolic oxidation x² = k·t with an Arrhenius rate constant — an approximation for diffusion-controlled oxidation, not every material or temperature; the vacuum panel suppresses the oxidant supply. The vacuum panel is shown only as a comparison scenario; the AXH1200 is specified with an atmosphere chamber, and no vacuum system is listed for this model — confirm the intended operating atmosphere at quotation. The simulator covers 200–1000 °C and does not model the AXH1200 operating range above 1000 °C. Curves are schematic, not performance data for a specific stage or sample.
Need cooling, or optical instead of XRD? · quick navigation
| Series | AXH1200this page | AXCH600 / AXCH400VXRD with cooling | AH1000 / AH1200optical UHT |
|---|---|---|---|
| Range | RT to 1200 °C — ceramic 20 × 20 mm stage, atmosphere chamber, 2θ 0°–164° | −190 to 600 / 400 °C — LN₂ + resistive, silver 23 × 23 mm stage, atmosphere or vacuum chamber | RT to 1000 / 1200 °C — ultra-high-temperature optical stages for microscopy |
| Page | — you are here — | AXCH600/AXCH400V → | AH1000/AH1200 → |
FAQ
Will it mount on my diffractometer?
The stage is adapted to your instrument with a custom mounting bracket: diffractometers from Rigaku, Bruker, Thermo Fisher Scientific, Shimadzu, Malvern Panalytical, and other manufacturers can be accommodated. Tell us your diffractometer model when requesting a quote and our engineers confirm the bracket and mounting arrangement.
Reflection or transmission — which one does it run?
The sample stage is selectable for reflection or transmission. State the geometry your experiment needs when requesting a quote, and the configuration for your diffractometer is confirmed at quotation.
What does the 0°–164° window mean for my scans?
The arc-shaped Kapton-film window follows the diffraction plane and provides a specified 2θ range of 0°–164°, so wide-angle scans can be performed within that range. Instrument-specific scan geometry is confirmed at quotation.
Does it cool below room temperature?
No — the specification lists resistive heating from room temperature to 1200 °C, and no cooling method is listed in the standard specification. For sub-ambient XRD, see the LN₂-cooled XRD Stage AXCH600/AXCH400V (−190 to 600 / 400 °C).
How does temperature control work?
Resistive heating is managed by the included temperature controller with setpoint, ramp, and multi-segment program modes at ±0.1 °C stability; the temperature control rate is adjustable from 0.1 to 20 °C/min. The standard configuration includes the temperature-control software and a water-circulation system.
How do I order?
The AXH1200 is supplied by quotation: request via this page or the InSitu Pro™ Stage Selector, and our engineers confirm the mounting bracket and configuration for your diffractometer and reply with pricing and lead time.
Related
- InSitu Pro™ Stage Selector — answer five questions and match the whole range, including the XRD family, with a one-click quote.
- XRD Stage AXCH600/AXCH400V — the LN₂-cooled XRD stages: −190 to 600 / 400 °C with a 2θ 0°–164° Kapton arc window and atmosphere or vacuum chamber.
- Ultra-High Temperature Heating Stage AH1000/AH1200 — the optical ultra-high-temperature stages for microscopy, RT to 1000 / 1200 °C.
- InSitu Pro™ Heating & Cooling Stages — browse the full range: optical, electrical, mechanics, and special applications.
Disclaimer: ACS Material, LLC believes the information on this page is accurate and represents the best and most current information available to us. Specifications reflect the manufacturer's current datasheet; idealized values are benchmarks and final configurations are confirmed at quotation — always refer to the model datasheet for guaranteed ratings. The interactive simulator is a schematic teaching tool, not performance data for a specific unit. ACS Material makes no representations or warranties, express or implied, regarding suitability for any purpose, and will not be responsible for damages resulting from use of or reliance upon this information.