Chemical vapor deposition, also known as CVD, is an effective way to produce high-quality graphene on a fairly large scale. With the ever-increasing demand for graphene by industrial and commercial companies, it’s no wonder that CVD has become a talking point for many manufacturers. The CVD growth of graphene is performed by depositing gaseous reactants onto a substrate. This process works by combining gas molecules (typically using carrier gases) inside of a reaction chamber, which is usually set at ambient temperature. When the gases come into contact with the substrate, a reaction occurs that creates a material film on the surface of the substrate. The temperature of the substrate must be controlled exactly, since that determines the kind of reaction that will occur. Although this is a sensitive process, it can be done relatively quickly and on a large enough scale to make it viable for mass production.