MATERIALS CATALOG
Product Detail
1. Product Introduction
ACS Material LLC® Graphene Oxide (GO) support film is available as Single Layer (0.6~1nm) or Double Layer (1~1.5nm) measured by EELS. It is hydrophilic and naturally placed over the ultra-flat Silicon Dioxide Substrate, Lacey Carbon (300 Mesh Copper TEM Grids) or Holy Silicon Nitride Membranes with typically 50-70% coverage. Available in package of 5, 10 or 25 pieces.
A. 300 Mesh Copper TEM grid with Lacey Carbon film;
B. 00nm-thick 2µm Diameter Holey Silicon Nitride Membrane on 200µm-thick Silicon Substrate;
C. 5x5mm 675µm-thick Silicon Die with 200nm Thermal Oxide.
2. Characterizations
A. Graphene On Lacey Carbon 300 Mesh Copper TEM Grids
- Thicknesses of Graphene Oxide Film: available in either 1 or 2 layers
- TEM Grids / Support Substrate: Lacey carbon support film on 300 mesh copper TEM grid (Grid Hole Size: 63µm)
|
SKU |
Layer of GO |
TEM Grid/AFM Substrate |
Support Film |
Package |
|
E23OL105 |
1 Layer |
300 Mesh Copper Grid |
Lacey Carbon |
5 p/pack |
|
E23OL111 |
1 Layer |
300 Mesh Copper Grid |
Lacey Carbon |
10 p/pack |
|
E23OL11B |
1 Layer |
300 Mesh Copper Grid |
Lacey Carbon |
25 p/pack |
|
E23OL205 |
2 Layers |
300 Mesh Copper Grid |
Lacey Carbon |
5 p/pack |
|
E23OL211 |
2 Layers |
300 Mesh Copper Grid |
Lacey Carbon |
10 p/pack |
|
E23OL21B |
2 Layers |
300 Mesh Copper Grid |
Lacey Carbon |
25 p/pack |
B. Graphene Oxide on Holey Silicon Nitride TEM Grids
- Thicknesses of Graphene Oxide Film: available in either 1 or 2 layers
- TEM Grids / Support Substrate: 200nm-thick 2µm Diameter Holey Silicon Nitride Membrane on 200µm-thick Silicon Substrate.
|
SKU |
Layer of GO |
TEM Grid/AFM Substrate |
Support Film |
Package |
|
EOSN0105 |
1 Layer |
2 μm Hole Silicon Nitride |
Silicon Nitride |
5 p/pack |
|
EOSN0111 |
1 Layer |
2 μm Hole Silicon Nitride |
Silicon Nitride |
10 p/pack |
|
EOSN011B |
1 Layer |
2 μm Hole Silicon Nitride |
Silicon Nitride |
25 p/pack |
|
EOSN0205 |
2 Layers |
2 μm Hole Silicon Nitride |
Silicon Nitride |
5 p/pack |
|
EOSN0211 |
2 Layers |
2 μm Hole Silicon Nitride |
Silicon Nitride |
10 p/pack |
|
EOSN021B |
2 Layers |
2 μm Hole Silicon Nitride |
Silicon Nitride |
25 p/pack |
C. Graphene Oxide on Ultra-flat Thermal SiO2 Substrate
- Thicknesses of Graphene Oxide Film: available in either 1 or 2 layers
- TEM Grids / Support Substrate: 5x5mm 675µm-thick Silicon Die with 200nm Thermal Oxide
|
SKU |
Layer of GO |
TEM Grid/AFM Substrate |
Support Film |
Package |
|
EOSI0105 |
1 Layer |
N/A |
Ultra-flat Silicon |
5 p/pack |
|
EOSI0111 |
1 Layer |
N/A |
Ultra-flat Silicon |
10 p/pack |
|
EOSI011B |
1 Layer |
N/A |
Ultra-flat Silicon |
25 p/pack |
|
EOSI0205 |
2 Layers |
N/A |
Ultra-flat Silicon |
5 p/pack |
|
EOSI0211 |
2 Layers |
N/A |
Ultra-flat Silicon |
10 p/pack |
|
EOSI021B |
2 Layers |
N/A |
Ultra-flat Silicon |
25 p/pack |
