Levon™ DM200-SE Enclosed Benchtop Spin Developer
Product Detail
Levon™ DM200-SE Enclosed Benchtop Spin Developer is a fully enclosed spin developer for substrates from fragments to 200 mm (8-inch) wafers, with a spin speed of 20–3,000 rpm (no load), an acceleration of 20–10,000 rpm/s (no load) and 100 customizable programs.
The DM200-SE has a 3-channel developer configuration, including one rinse channel and one nitrogen drying channel. It has a Teflon-coated stainless steel interior, an anti-corrosion housing with a non-stick surface, and a built-in filter for pump protection. Vacuum pressure is adjustable with live monitoring, and liquid delivery and recovery (suction) are adjustable. Tailored options include 4-channel configurations or custom wafer sizes.
Why choose the DM200-SE
Specifications General — DM200-SE
| Parameter | Specification |
|---|---|
| Brand | Levon™ by ACS Material |
| Model | DM200-SE |
| SKU # | LVDM2000 |
| Product Type | Spin developer |
| Supported wafer size | From fragments to 200 mm (8-inch wafer) |
| Spin speed | 20–3,000 rpm (no load) |
| Speed resolution | ±1 rpm |
| Spin acceleration | 20–10,000 rpm/s (no load) |
| Recipe time setting | 0–3,000 s per step; time setting precision 0.1 s |
| Maximum spin time | 30,000 s |
| Spin time resolution | 0.1 s |
| Programs | Single-step or multi-step mode with 100 customizable programs |
| Developer channels | 3 channels, including 1 × rinse and 1 × nitrogen drying |
| Development chamber | Fully enclosed |
| Interior | Teflon-coated stainless steel |
| Housing | Anti-corrosion housing with non-stick surface |
| Pump protection | Built-in filter for pump protection |
| Vacuum control | Adjustable vacuum pressure with live monitoring |
| Flow and suction | Adjustable liquid delivery and recovery |
| Tailored options | 4-channel configurations or custom wafer sizes |
| Dimensions [W × D × H] | 550 × 600 × 405 mm |
| Weight | 35 kg |
| Packing | Packed in a wooden case |
| Warranty | 1-year product warranty |
Package contents
| Supplied with the instrument | Qty |
|---|---|
| Levon™ DM200-SE Enclosed Benchtop Spin Developer main unit | 1 |
External utilities, where required, are supplied by the user. Package contents reflect the current published configuration; the itemized bill of materials is confirmed on the quotation.
Where it fits
Frequently asked questions
What spin speed and acceleration does the DM200-SE offer?
Spin speed 20–3,000 rpm (no load) with ±1 rpm speed resolution; spin acceleration 20–10,000 rpm/s (no load).
Which substrate sizes are supported?
From fragments to 200 mm (8-inch) wafers. Custom wafer sizes are available as a tailored developer solution.
How are development programs set?
Single-step or multi-step mode with 100 customizable programs. Recipe time setting 0–3,000 s per step with 0.1 s setting precision; maximum spin time 30,000 s; spin time resolution 0.1 s.
How many developer channels are there?
The standard configuration has 3 channels, including 1 × rinse and 1 × nitrogen drying. 4-channel configurations are available as a tailored option.
What are the dimensions and weight?
550 × 600 × 405 mm (W × D × H), 35 kg, packed in a wooden case.