MATERIALS CATALOG

CVD Method Monolayer WS2

CVD Method Monolayer WS2

$895.00

Availability: In stock

Product Detail

CAS-No.: 12138-09-9 (WS2); 60676-86-0 (SiO2); 1344-28-1 (Al2O3); 1344-28-1 (Sapphire)

1. Preparation Method

CVD Method

2. Characterizations

Substrate:

SiO2/Al2O3/Sapphire

Size:

9 mm*9 mm

Thickness

0.6-0.8 nm

Diameter range:

20-50 μm

 Typical Microscope Image (2) of ACS Material Monolayer WS2 on SiO2 (20-50μm)

Typical Microscope Image of ACS Material Monolayer WS2 on SiO2 (20-50μm) 

 Typical Optical Spectrum Image of ACS Material Monolayer WS2 on SiO2 (20-50μm)

Typical Optical Spectrum Image of ACS Material Monolayer WS2 on SiO2 (20-50μm)

3. Application Fields

An excellent device material for studying the number of layers and fluorescence effects.

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