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Mechanically Exfoliated Monolayer MoS2 on Substrates

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SKU# LE01

Each piece is unique.

Product Detail

CAS No.: 1317-33-5 (MoS2); 60676-86-0 (SiO2) 

NOTE: Each piece is unique and the technical information below and TDS are for reference only.

1. Preparation Method

Mechanical Exfoliation Method

2. Characterizations

Substrate:

SiO2 Substrate

Substrate size:

10 mm x 10 mm

Monolayer MoS2 Area:

>10 µm2

 

 Image of Monolayer MoS2 on SiO2

Typical Image of ACS Material Mechanically Exfoliated Monolayer MoS2 on SiO2 substrate

 

 AFM of Monolayer MoS2 on SiO2

 

Typical AFM Image of ACS Material Mechanically Exfoliated Monolayer MoS2 on SiO2 substrate

 

 

 3. Application Fields

An excellent device materials for studying the number of layers and fluorescence effects.

 

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FAQ

1. What is the thickness of the SiO2 layer of Mechanically Exfoliated Monolayer MoS2 on SiO2 Substrates? Is this a natively oxidized layer or a thermally oxidized layer?

The thickness of SiO2 layer is about 300nm, and it’s a thermally oxidized layer.