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  • Perovskite Film Fabrication: Spin Coating, Antisolvent Timing and Annealing

    Oct 24, 2026 | ACS MATERIAL LLC

    Perovskite films begin to crystallise during the few seconds of spinning, so how and when nucleation is triggered strongly influences film quality. This guide explains the one-step and two-step routes, the antisolvent step and its timing, how to write the spin program, why atmosphere and substrate temperature matter, how annealing shapes the film, and where to go when a process outgrows spin coating.

    Perovskite spin coating: depositing a metal halide perovskite precursor solution by spinning it on a substrate, sometimes using an antisolvent treatment to control crystallisation, followed by a composition-specific drying or annealing process [4][5].

    In one paragraph: Perovskite films crystallise rather than simply dry, so nucleation control is a central part of the process [4][5]. An antisolvent applied to the spinning wet film can influence nucleation and morphology; its timing and application rate matter [4][5][7]. Record the drip timing relative to the spin program, control the atmosphere, and treat substrate temperature as a recipe parameter [11][12][14]. Annealing temperature, time and atmosphere shape morphology, coverage and stability [15][16][17].

    A small glass substrate with a smooth, dark, mirror-like perovskite film on a spin coater chuck
    Perovskite spin coating: a uniform dark perovskite film on a glass substrate. Illustration, not to scale.

    1.  Why Spin Coating for Perovskite Films

    Metal halide perovskites entered photovoltaics in 2009, when Kojima and co-workers used organometal halide perovskites as visible-light sensitizers in photoelectrochemical cells [1]. Since then, most laboratory perovskite films have been made from solution, and spin coating is the method most labs start with: it needs a few drops of precursor solution, gives a film in under a minute, and the same program can be repeated on every substrate.

    Spin coating a perovskite is not the same as spin coating a polymer, though. The film does not simply dry; it crystallises. The precursor solution contains lead halide and organic or inorganic cation salts dissolved in polar solvents, and the species in solution, including complexes with the solvent, affect the film that forms [3]. When and how fast crystals nucleate during the few seconds of spinning strongly influences whether the film is dense and continuous or rough and full of gaps [4][5][16].

    This guide covers the process steps a lab controls: the deposition route, the antisolvent step and its timing, the spin program, the atmosphere, substrate temperature, and the anneal. It closes with troubleshooting and the route to larger areas. It describes general process logic from the cited literature; it does not give a recipe for a specific composition, and it makes no claims about device efficiency. General spin coating background is in Spin Coating Explained: Stages, Physics and Film Thickness.

    2.  One-Step and Two-Step Routes

    Two families of solution routes are common in the literature:

    RouteWhat happensReference examples
    One-stepAll precursors in one solution; spin coating, often with a crystallisation-control step such as an antisolvent treatment, then annealingSolvent engineering with an antisolvent drip [4]; fast deposition–crystallisation [5]
    Two-step (sequential)A lead halide film is deposited first and then converted to perovskite by exposure to a solution of the organic cation saltSequential deposition [2]

    Simplified overview; many variants exist, including vapour-assisted conversion and additive approaches.

    In the sequential route described by Burschka and co-workers, lead iodide was deposited from solution into a nanoporous titanium dioxide film and then transformed into the perovskite by exposure to a solution of methylammonium iodide [2]. The one-step route combines everything in one solution and relies on controlling crystallisation during spinning. Compositional work, such as mixing formamidinium lead iodide with methylammonium lead bromide, has used the one-step route with an antisolvent step [8].

    Either way, the precursor solution is a starting point that deserves attention: interactions between the precursors and coordinating solvent molecules lead to intermediate species and phases that affect how uniform and dense the film becomes [3]. Make solutions the same way every time and record how old they are when coated.

    3.  The Antisolvent Step and Its Timing

    Antisolvent treatment is widely used in perovskite spin coating. During spinning, a second solvent that is compatible with the host-solvent system but reduces precursor solubility is applied to the wet film. Depending on the precursor chemistry, solvent interactions and application conditions, this can promote nucleation and influence the resulting film morphology [4][5][7].

    • Solvent engineering. Jeon and co-workers used a mixed solvent containing DMSO and dripped toluene during spinning. They reported that an intermediate phase formed with the solvent and converted to a uniform, dense perovskite film on annealing [4].
    • Fast deposition–crystallisation. Xiao and co-workers spin coated a DMF solution and exposed the wet film to a second solvent, such as chlorobenzene, immediately after deposition to induce crystallisation, giving flat, uniform films [5].
    • Antisolvent choice and morphology. Paek and co-workers studied how the antisolvent treatment shapes the morphology of perovskite films from the nanometre to the micrometre scale [6].
    • Application rate. Taylor and co-workers compared 14 antisolvents in nearly 800 devices and reported that the rate at which the antisolvent is applied, matched to the properties of the antisolvent, is a key variable for obtaining good films [7].

    Timing: when the drip lands

    The common thread is timing. Reported drip delays and antisolvent volumes vary widely between published studies [7], so there is no universal drip time. The right moment depends on the solution, the antisolvent, the spin speed, the volume and the room conditions, so labs determine it experimentally and then keep everything else constant [4][5][7].

    What makes antisolvent work reproducible is to treat the drip as a defined, recorded part of the recipe:

    • define the drip time relative to a stated point in the spin program, such as the start of a step, and record it;
    • keep the antisolvent volume and application rate constant [7], and record the pipette or nozzle height;
    • dispense onto the centre of the rotating substrate;
    • keep the time between antisolvent drip and annealing constant.

    Dispensing technique in general, from static and dynamic dispense to nozzle height, is covered in Static vs Dynamic Dispense in Spin Coating: Volume, Coverage and Material Waste.

    4.  Writing the Spin Program

    The film thickness of a spin-coated layer follows the same physics as any other solution: once the film has set, thickness falls approximately with the reciprocal square root of the spin speed [9][10], and in Meyerhofer’s model it increases with the initial viscosity of the solution [9]. A spin curve for your solution therefore remains the best way to hit a target thickness; see Spin Coating Explained: Stages, Physics and Film Thickness for the physics and the stages of spinning.

    Perovskite programs are typically written in two or more steps, with the antisolvent drip placed inside one of them. Instead of copying numbers from a paper, define each step by what it has to do:

    Program stepPurposeWhat to decide and record
    Spread (optional)Distribute the solution over the substrateSpeed, ramp, time; whether the solution is dispensed before or during rotation
    ThinningThin the film to near its final thicknessFinal speed (from the spin curve), ramp, time
    Antisolvent dripPromote nucleationDrip time within the step, volume, dispensing rate and height
    FinishSpin off excess and dryRemaining time at speed; time to the hot plate

    Template for documenting a program; values depend on the composition and solvent system and are found experimentally.

    Ramps matter as well. A fast ramp reaches the final speed before much solvent has evaporated, while a slow ramp lets the film start to dry at lower speed; how acceleration changes thickness and uniformity is covered in Spin Coating Acceleration and Multi-Step Recipes: What the Ramp Actually Does. Defects that come from the coater rather than the chemistry, such as comets, streaks and edge beads, are treated in Spin Coating Defects: Comets, Striations, Pinholes and Edge Beads Diagnosed.

    Because the drip is timed relative to the spin program, record its intended time and the method used to deliver it. Fine step-time resolution and multi-step recipe storage can help document the sequence, but do not by themselves establish automated dispensing or synchronisation between a dispenser and the spin program.

    5.  Atmosphere: Oxygen, Moisture and the Glovebox

    Many perovskite compositions react with their environment. Aristidou and co-workers studied the role of oxygen in the degradation of methylammonium lead iodide films under light [11]. Leguy and co-workers showed that methylammonium lead iodide hydrates reversibly in humid air in films, crystals and devices [12]. Moisture is not only harmful, however: You and co-workers reported that annealing the precursor film in a humid environment, such as ambient air, improved film quality and grain size in their process [13].

    The practical conclusion is that atmosphere is a process variable to control and record, whatever the target:

    • Glovebox processing. Coating and annealing in a nitrogen glovebox removes most of the variation from room humidity. Spin coaters and hot plates designed to fit into a glovebox make this practical.
    • Ambient processing. If films are made in air, record relative humidity and temperature for every run, and expect results to drift with the weather.
    • Solvent vapour. Repeated coating can introduce solvent vapour into a glovebox and affect evaporation or atmosphere management. Assess solvent loading, exhaust and purification requirements, and follow the glovebox manufacturer’s and laboratory’s approved operating procedure rather than assuming that routine purging alone will stabilise the process.

    Annealing under nitrogen outside a glovebox, and what an inert hot plate can and cannot do, is covered in Annealing Under Nitrogen: Inert Hot Plates for Air-Sensitive Films.

    6.  Substrate Temperature and Hot Casting

    Substrate and solution temperature are further levers. Nie and co-workers reported a hot-casting technique in which a hot precursor solution is spin coated onto a hot substrate, producing perovskite films with millimetre-scale grains [14]. Even without going that far, the substrate temperature changes how fast solvent evaporates during spinning and therefore when crystallisation starts.

    A heated spin coater allows the spin-table temperature to be controlled during the run. The actual substrate and wet-film temperatures may differ from the setpoint, so qualify the thermal conditions for the intended process. How temperature changes evaporation, viscosity and thickness, and the limits of heated spin tables, are covered in Heated Spin Coating: How Substrate Temperature Changes Evaporation and Thickness.

    7.  Annealing: Temperature, Coverage and Stability

    Almost every solution-processed perovskite film is annealed on a hot plate after spinning to complete crystallisation and remove residual solvent. The anneal also shapes the film:

    • Temperature and morphology. Dualeh and co-workers showed that the annealing temperature affects the film morphology of a solution-processed perovskite and, with it, device behaviour [15].
    • Coverage. Eperon and co-workers showed for planar films that surface coverage depends on processing conditions including the annealing temperature, the film thickness and the atmosphere, and that incomplete coverage limits device performance [16].
    • Thermal stability. Conings and co-workers reported that methylammonium lead iodide degrades on heating even in an inert atmosphere, an intrinsic thermal instability rather than only an effect of air or moisture [17].

    Together, these results argue for a precise, well-documented anneal: a hot plate whose temperature is accurate and uniform across the substrate, a fixed time, a fixed time between spinning and annealing, and a defined atmosphere. What soft bake, post-bake and anneal steps do in general is explained in Soft Bake, Post-Bake and Annealing on a Hot Plate: What Each Step Does; annealing under nitrogen is covered in Annealing Under Nitrogen: Inert Hot Plates for Air-Sensitive Films.

    8.  Troubleshooting Perovskite Films

    SymptomPossible causesWhat to check
    Incomplete coverage, gaps between grainsCrystallisation not controlled; annealing conditions; film too thin [4][16]Antisolvent timing and rate; annealing temperature; solution concentration
    Rough, hazy filmAntisolvent or application rate not suited to the precursor solution [6][7]; drip timingAntisolvent choice, drip timing, volume and application rate
    Run-to-run variationManual timing, changing humidity [12], solution age, varying time to annealDefine and record the drip timing; record humidity and solution age; fix the transfer time
    Comets, streaksParticles, bubbles, dispensing faultsFilter solution; see the defects guide
    Film colour changes after annealDecomposition from excessive temperature or time [15][17]Anneal temperature and time; atmosphere
    Edge thicker than centreEdge bead; square substrateSpin program; substrate geometry

    Starting points summarised from the cited literature and general spin coating practice; the right fix depends on the composition.

    Coating-side defects in more depth are in Spin Coating Defects: Comets, Striations, Pinholes and Edge Beads Diagnosed. Choosing a spin coater for this kind of work, from substrate size to glovebox fit, is covered in How to Choose a Lab Spin Coater: Speed, Acceleration, Substrate Size and Glovebox Fit.

    9.  Beyond Spin Coating and Further Reading

    Spin coating is widely used at laboratory scale, while larger-area processes can use other deposition methods. Deng and co-workers demonstrated perovskite active layers made by doctor-blade coating [18]. Gas quenching is another approach used to control solvent extraction and crystallisation in solution-processed perovskite films, including films made by blade coating [19]. Its suitability depends on the coating method and formulation. What changes when a recipe moves from spin coating to blade or slot-die coating is the topic of From Spin Coating to Slot-Die and Blade: Scaling a Thin-Film Ink; gas quenching is covered in Air-Knife and Gas Quenching for Blade- and Slot-Die-Coated Films.

    Perovskite case studies on this blog

    Several earlier articles on this blog summarise published perovskite work in which graphene materials were used in the device stack:

    10.  Levon™ Spin Coaters and Hot Plates for Perovskite Films

    The tables quote the Levon™ product pages; “Not stated” means the page does not give the value. The EZ4-S, IC5000-S and AC200 pages list perovskite solar-cell and organic optoelectronic semiconductor research among their application areas. These application listings do not establish a validated recipe or a particular film outcome.

    SpecificationEZ4-SIC5000-SAC200
    Speed100–9,999 rpm100–5,000 rpmS-PP, SE: 20–10,000 rpm; PE: max. 10,000 rpm; SE-PLUS: max. 8,000 rpm (no load where stated)
    Acceleration100–9,999 rpm/s100–5,000 rpm/sS-PP, SE, PE: up to 50,000 rpm/s; SE-PLUS: max. 10,000 rpm/s (no load where stated)
    ProgramsUp to 5 programs × 5 stepsUp to 100 recipes × 100 stepsS-PP, SE, PE: 100 recipes × 100 steps
    Step timeMax. 3,000 s, 1 s resolutionMax. 3,000 s, 0.1 s resolutionMax. 3,000 s per step, 0.1 s resolution
    SubstratesMax. recommended 4-inch round; chucks 10 mm, 25 mm, 2-inchJaw chuck stage for 10–35 mm square or circular substratesFragments to 8-inch wafers (model-specific limits)
    Substrate heatingNot statedSpin table RT to 150 °C; ≤±0.5 °C after stabilization; uniformity ≤±2%Not stated
    GloveboxGlovebox-compatible designNot statedCan be recessed into a glovebox
    Housing / cavityEZ4-S: aluminum alloy; EZ4-S-PP: corrosion-resistant PPHDPE inner cavity, PC cover, sheet metal shellPP housing (S-PP) or HDPE chamber/cup; PC cover
    Automatic dispensingNot statedPrecise metering automatic dispensing (upgrade)S-PP, SE, PE: four-channel automatic dispensing ports

    Specifications as published on the Levon™ product pages on 22 October 2026, where “no load” is stated by the page. The supplied configuration is confirmed in the quotation.

    SpecificationHP6HP100-SA
    Heating plateØ170 mm circular, hard-anodized aluminum; wafers up to 6 inchesHard-anodized aluminum; size not stated
    Temperature rangeRT to 250 °CRT to 300 °C
    Control precision / accuracy±0.2 °C (after the temperature is stable)≤±0.2 °C
    Temperature uniformity≤1%RT to 200 °C: ≤±1%; 200 °C to 300 °C: ≤±1.5%
    Substrate hold-downManually activated vacuum chuck; close-contact resist baking modeHP100-PA: vacuum adsorption
    GloveboxCompact recessed design for glovebox integrationHeight-reducible, flush-mount design
    NitrogenNot statedNitrogen input requirement 0.04–0.4 MPa (supplied by the user); nitrogen charging listed as an additional customization function
    Residual oxygen or moisture levelNot statedNot stated
    ProgramsDigital controller; optional linear control7-inch touchscreen, PLC; HP100-PA: linear heating 0.5–10 °C/min, 100 recipes × up to 30 stages

    Specifications as published on the Levon™ product pages on 22 October 2026. The HP100-SA page does not state a residual oxygen or moisture level; a hot plate with nitrogen input is not a substitute for a glovebox. The supplied configuration is confirmed in the quotation.

    How this connects to the guide: the EZ4-S has a glovebox-compatible design for round substrates up to the 4-inch maximum recommended diameter, relevant to the glovebox processing of Section 5. The AC200 series can be recessed into a glovebox and runs 100 recipes of up to 100 steps at 0.1 s step-time resolution on the S-PP, SE and PE models, which can help document the step during which an antisolvent drip is made (Section 4). The IC5000-S heats the spin table from room temperature to 150 °C for the substrate-temperature work of Section 6. For annealing (Section 7), the HP6 has a recessed design for glovebox integration and reaches 250 °C with ±0.2 °C control precision after stabilisation; the HP100-SA has a nitrogen input and a height-reducible, flush-mount design. Questions about a specific configuration can be sent through the contact form.

    11.  Keep Exploring the Perovskite and Thin-Film Knowledge Hub

    Start here

    Process steps

    Links will be added as each article is published.

    Equipment

    Questions about a specific instrument can be sent through the contact form.

    12.  FAQ

    What does the antisolvent do in perovskite spin coating?

    It changes the solvent environment of the wet precursor film and can promote crystallisation. The resulting nucleation and morphology depend on the antisolvent, precursor formulation and application conditions [4][5][7].

    When should the antisolvent be dripped?

    There is no universal time; reported drip delays vary widely between studies, so the moment is found experimentally for the solution and spin program and then kept constant [4][5][7].

    Does the antisolvent application rate matter?

    Yes. Taylor and co-workers reported the application rate, matched to the antisolvent, as a key variable [7].

    What is the difference between one-step and two-step perovskite deposition?

    One-step coats all precursors at once; two-step deposits lead halide first and converts it with a cation salt solution [2][4].

    Do I need a glovebox for perovskite spin coating?

    Not always, but oxygen and moisture affect many compositions, so control and record the atmosphere [11][12][13].

    Why does annealing temperature matter?

    It affects morphology and coverage, and excessive heating can degrade some compositions even in inert gas [15][16][17].

    13.  References

    1Kojima A, Teshima K, Shirai Y, Miyasaka T. Organometal halide perovskites as visible-light sensitizers for photovoltaic cells. J Am Chem Soc. 2009;131(17):6050–6051. DOI: 10.1021/ja809598r
    2Burschka J, Pellet N, Moon SJ, Humphry-Baker R, Gao P, Nazeeruddin MK, et al. Sequential deposition as a route to high-performance perovskite-sensitized solar cells. Nature. 2013;499(7458):316–319. DOI: 10.1038/nature12340
    3Jung M, Ji SG, Kim G, Seok SI. Perovskite precursor solution chemistry: from fundamentals to photovoltaic applications. Chem Soc Rev. 2019;48(7):2011–2038. DOI: 10.1039/C8CS00656C
    4Jeon NJ, Noh JH, Kim YC, Yang WS, Ryu S, Seok SI. Solvent engineering for high-performance inorganic–organic hybrid perovskite solar cells. Nat Mater. 2014;13(9):897–903. DOI: 10.1038/nmat4014
    5Xiao M, Huang F, Huang W, Dkhissi Y, Zhu Y, Etheridge J, et al. A fast deposition-crystallization procedure for highly efficient lead iodide perovskite thin-film solar cells. Angew Chem Int Ed. 2014;53(37):9898–9903. DOI: 10.1002/anie.201405334
    6Paek S, Schouwink P, Athanasopoulou EN, Cho KT, Grancini G, Lee Y, et al. From nano- to micrometer scale: the role of antisolvent treatment on high performance perovskite solar cells. Chem Mater. 2017;29(8):3490–3498. DOI: 10.1021/acs.chemmater.6b05353
    7Taylor AD, Sun Q, Goetz KP, An Q, Schramm T, Hofstetter Y, et al. A general approach to high-efficiency perovskite solar cells by any antisolvent. Nat Commun. 2021;12:1878. DOI: 10.1038/s41467-021-22049-8
    8Jeon NJ, Noh JH, Yang WS, Kim YC, Ryu S, Seo J, et al. Compositional engineering of perovskite materials for high-performance solar cells. Nature. 2015;517(7535):476–480. DOI: 10.1038/nature14133
    9Meyerhofer D. Characteristics of resist films produced by spinning. J Appl Phys. 1978;49(7):3993–3997. DOI: 10.1063/1.325357
    10MicroChemicals GmbH. Spin-coating of photoresists. Application note, Basics of Microstructuring series. Available at: microchemicals.com (accessed 22 October 2026)
    11Aristidou N, Sanchez-Molina I, Chotchuangchutchaval T, Brown M, Martinez L, Rath T, et al. The role of oxygen in the degradation of methylammonium lead trihalide perovskite photoactive layers. Angew Chem Int Ed. 2015;54(28):8208–8212. DOI: 10.1002/anie.201503153
    12Leguy AMA, Hu Y, Campoy-Quiles M, Alonso MI, Weber OJ, Azarhoosh P, et al. Reversible hydration of CH3NH3PbI3 in films, single crystals, and solar cells. Chem Mater. 2015;27(9):3397–3407. DOI: 10.1021/acs.chemmater.5b00660
    13You J, Yang YM, Hong Z, Song TB, Meng L, Liu Y, et al. Moisture assisted perovskite film growth for high performance solar cells. Appl Phys Lett. 2014;105(18):183902. DOI: 10.1063/1.4901510
    14Nie W, Tsai H, Asadpour R, Blancon JC, Neukirch AJ, Gupta G, et al. High-efficiency solution-processed perovskite solar cells with millimeter-scale grains. Science. 2015;347(6221):522–525. DOI: 10.1126/science.aaa0472
    15Dualeh A, Tétreault N, Moehl T, Gao P, Nazeeruddin MK, Grätzel M. Effect of annealing temperature on film morphology of organic–inorganic hybrid perovskite solid-state solar cells. Adv Funct Mater. 2014;24(21):3250–3258. DOI: 10.1002/adfm.201304022
    16Eperon GE, Burlakov VM, Docampo P, Goriely A, Snaith HJ. Morphological control for high performance, solution-processed planar heterojunction perovskite solar cells. Adv Funct Mater. 2014;24(1):151–157. DOI: 10.1002/adfm.201302090
    17Conings B, Drijkoningen J, Gauquelin N, Babayigit A, D’Haen J, D’Olieslaeger L, et al. Intrinsic thermal instability of methylammonium lead trihalide perovskite. Adv Energy Mater. 2015;5(15):1500477. DOI: 10.1002/aenm.201500477
    18Deng Y, Peng E, Shao Y, Xiao Z, Dong Q, Huang J. Scalable fabrication of efficient organolead trihalide perovskite solar cells with doctor-bladed active layers. Energy Environ Sci. 2015;8(5):1544–1550. DOI: 10.1039/C4EE03907F
    19Azhar M, Yalcinkaya Y, Cuzzupè DT, Abebe Temitmie Y, Haider MI, Schmidt-Mende L. Perovskite thin films solar cells: the gas quenching method. Mater Sustain. 2025;1(1):5. DOI: 10.53941/matsus.2025.100005
    Disclaimer: ACS Material LLC believes that the information in this guide is accurate and represents the most current information available to us. ACS Material makes no representations or warranties, either express or implied, regarding the suitability of any Levon™ instrument for any particular purpose or the accuracy of the information listed here. Specifications are those published on the Levon™ product pages on 22 October 2026; “not stated” means the page does not give the value. Final configurations are confirmed at quotation. The process behaviour described is summarised from the cited literature; it is not a measurement or result from Levon™ equipment, and no device performance is implied. Perovskite precursors contain lead compounds; follow the safety data sheets and your institution’s rules for lead, solvents and waste.